Carbon coater – rotary pumped

Q150R series from Quorum Technologies

Carbon coaters of the Q150R series are fully automated, modular coating systems for the application of fine-grained carbon films for SEM and TEM. The Q150R comes either as carbon coater (RE) or as a combination of sputter and carbon coater (RES). Carbon sources can be both carbon rods and filaments.  

Features
Fully automatic coating process
Large chamber: 165 mm in diameter
Fast turnover times / coating cycles
Carbon fiber (rod insert is also available)
Optional metal evaporation head insert
Q150R ES carbon coater /sputter coater combination

Using the basic unit and its various options, the Q150R can be used for both carbon coating (RE / (RES) and metal evaporation. The different head plates can easily be exchanged within seconds. The unit recognizes the replacement and the operating menu changes accordingly. A touch screen is used to enter coating parameters, display the coating sequence and show error messages. Multiple users can store their recipes including all parameters. Awarded access rights protect selected parameters against deletion and unauthorized modification. Only the administrator has access to all settings. A number of optional sample stages ensure the efficient and repeatable coating of samples within a wide range of geometries.

Operating principle
Thin conductive layers of carbon are generated by resistive evaporation of carbon filaments or rods. A current of up to 90 A is needed to evaporate carbon from rod or filament. The pulsed carbon rod/fiber evaporation can be controlled by using an optional film thickness monitor.
For TEM applications like the production of carbon support films or surface replicas please refer to models Q150TE, TES or K975X.

Specifications Q150 RS / RE / RES
Instrument case585 mm W x 470 mm D x 410 mm H (total height with coating head open: 650 mm)
Weight 28.4 kg
Packed dimensions 725 mm W x 660 mm D x 680 mm H (37 kg)
Work chamberBorosilicate glass 152 mm ID x 127 mm H
Safety shieldIntegral polyethylene terephthalate (PET) cylinder
Display145 mm x 320 mm x 240 mm colour graphic thin film transistor (TFT) display
User interfaceIntuitive full graphical interface with touch screen buttons, includes features such as a log of the last 10 coatings carried out and reminders for when maintenance is due
Sputter targetDisc style 57 mm Ø x 0.1 mm thick gold (Au) target is fitted as standard. (R S/R ES versions only)
Vacuum
Rotary pump 50 l/min. two-stage rotary pump with oil mist filter (order separately, see AG-DS102)
Vacuum measurementPirani gauge
Typical ultimate vacuum2x10-2 mbar in a clean system after pre-pumping with dry nitrogen gas
Specimen stage 50 mm Ø rotation stage. Rotation speed 8-20 RPM. For alternative stages see options and accessories
Process
Sputtering0–80 mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximium sputtering time is 60 minutes (without ‘breaking’ vacuum and with built in rest periods)
Carbon evaporationA robust, ripple free DC power supply featuring pulse evaporation or ensures reproducible carbon evaporation from rod or fibre sources. Current pulse: 1–90 A
Glow dischargeOperates at 100 mA in DC+ mode and 30 mA in DC- mode
GasesArgon sputtering process gas, 99.999% (TS and TES versions)
Electrical supply90–250 V 50/60 Hz 1400 VA including rotary pump power. 110/240 V voltage selectable
ConformityCE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, which means reduced running costs
Options and accessories
10879 Carbon rod evaporation insert for 3.05 mm Ø rods (T E and T ES only). Includes manual rod shaper and 3.05 mm Ø x 300 mm (pack of ten) carbon rods
10262  Glow discharge insert. Used to modify surface properties (eg hydrophobic to hydrophilic conversion) (R S and R ES versions only). Can be retrofitted
10726 Additional sputter insert for quick metal change (R E and R ES versions only). NB: This is an entire sputtering assembly; individual targets can also be purchased
10360Variable angle 'Rotacota' rotary planetary specimen stage (rotational speed 8-20 RPM). 50 mm Ø specimen platform with six stub positions for 15 mm, 10 mm, 6.5 mm or 1/8" pin stubs. Stage rotation speed variable between 8–20 RPM
10357 Variable tilt angle specimen stage with adjustable tilt up to 90˚. 50 mm Ø specimen platform with six stub positions for 15 mm, 10 mm, 6.5 mm or 1/8" pin stubs. Stage rotation speed variable between 8–20 RPM
10458 Flat rotation specimen stage for 4"/100 mm wafers, includes gear box for increased coverage. Stage rotation speed variable between 8-20 RPM
10358 90 mm Ø specimen stage for glass microscope slides (up to two x 75 mm x 25 mm slides). Stage rotation speed variable between 8–20 RPM. Includes gear box to allow optional FTM to be used
10454 Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and quartz crystals
10429Extended height vacuum chamber (214 mm in height - the standard chamber is 127 mm high). For increased source to specimen distance and for coating large specimens
10731Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the Q150R when bench depth is limited
Thermal evaporation

Thermal evaporation of carbon to generate thin conductive layers for scanning electron microscopy applications like energy dispersive x-ray spectroscopy (EDS) and wavelength dispersive x-ray spectrometry (WDS).  

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