Carbon coater – high vacuum
Q150T series from Quorum Technologies
Carbon coaters of the Q150T series are fully automated, modular coating systems for the application of fine-grained carbon films for SEM and TEM. The Q150T comes either as carbon coater (TE) or as combination of sputter and carbon coater (TES). Carbon sources can be both carbon rods and filaments.
|Fully automatic coating process|
|Built-in turbo pump|
|Large chamber: 165 mm in diameter|
|Fast turnover times / coating cycles|
|Carbon rod (fiber insert is also available)|
|Optional metal evaporation head insert|
|Q150T ES carbon coater /sputter coater combination|
Using the basic unit and its various options, the Q150T can be used for both carbon coating (TE / (TES) and metal evaporation. The different head plates can easily be exchanged within seconds. The unit recognizes the replacement and the operating menu changes accordingly. A touch screen is used to enter coating parameters, display the coating sequence and show error messages. Multiple users can store their recipes including all parameters. Awarded access rights protect selected parameters against deletion and unauthorized modification. Only the administrator has access to all settings.
A number of optional sample stages ensure the efficient and repeatable coating of samples within a wide range of geometries.
Thin conductive layers of carbon are generated by resistive evaporation of carbon filaments or rods. A current of up to 90 A is needed to evaporate carbon from rod or filament. Pulsed or ramped carbon coating modes are available. Pulsed evaporation is suitable for most SEM carbon coating processes. For applications requiring enhanced control and deposition thickness reproducibly the ramped evaporation process can be selected (only carbon rod) for carbon evaporation.
High-vacuum carbon coaters are used in TEM and high resolution SEM for producing very thin amorphous carbon layers which require high-vacuum.
For TEM applications like the production of carbon support films or surface replicas please refer to models Q150TE, TES or K975X.
|Specifications Q150 TS / TE / TES|
|Instrument case||585 mm W x 470 mm D x 410 mm H (total height with coating head open: 650 mm)|
|Packed dimensions||725 mm W x 660 mm D x 680 mm H (42 kg)|
|Work chamber||Borosilicate glass 150 mm ID x 127 mm H|
|Safety shield||Integral polyethylene terephthalate (PET) cylinder|
|Display||145 mm x 320 mm x 240 mm colour graphic thin film transistor (TFT) display|
|User interface||Intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 10 coatings carried out and reminders for when maintenance is due|
|Sputter target||Disc style 54 mm Ø or 57 mm Ø. A 0.3 mm thick chromium (Cr) is fitted as standard. TS/TES versions only|
|Turbo-molecular pump||Internally-mounted, 70 l/sec. air-cooled turbo-molecular pump|
|Rotary pump||50 l/min. two-stage rotary pump with oil mist filter (order separately, see AG-DS102)|
|Vacuum measurement||Pirani gauge as standard. A full range gauge (10428) is available as an option|
|Typical ultimate vacuum||5x10-5 mbar|
|Sputter vacuum range||Between 5x10-3 and 5x10-1 mbar|
|Specimen stage||50 mm Ø rotation stage. Rotation speed 8-20 RPM. For alternative stages see options and Aaccessories|
|Sputtering||0–150 mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximium sputtering time is 60 minutes (without ‘breaking’ vacuum and with built in rest periods)|
|Carbon evaporation||A robust, ripple free DC power supply featuring pulse evaporation or ensures reproducible carbon evaporation from rod or fibre sources. Current pulse: 1–90 A|
|Metal evaporation and|
aperture cleaning insert
|For thermal evaporation of metals from filaments or boats. For cleaning SEM or TEM apertures a standard molybdenum boat (supplied) can be fitted. The metal evaporation head is set up for downwards evaporation, but upward evaporation can be achieved by fitting two terminal extensions (supplied). Evaporation times: up to four minutes|
|Services and other information|
|Gases||Argon sputtering process gas, 99.999% (TS and TES versions)|
|Electrical supply||90–250 V 50/60 Hz 1400 VA including rotary pump power. 110/240 V voltage selectable|
|Conformity||CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, which means reduced running costs|
|Options and accessories|
|10879||Carbon rod evaporation insert for 3.05 mm Ø rods (T E and T ES only). Includes manual rod shaper and 3.05mm Ø x 300 mm (pack of ten) carbon rods|
|10837||Glow discharge insert. Used to modify surface properties (eg hydrophobic to hydrophilic conversion) (R S and R ES versions only). Can be retrofitted|
|10457||Metal evaporation and aperture insert, including the ability to evaporate upwards or downwards (TE and TES version only). Supplied with a pack of 10 tungsten filaments and a molybdenum (Mo) boat|
|10455||Carbon fibre insert, supplied with 1m carbon fibre cord and 1m of standard grade carbon fibre cord. NB: For additional supplies see Carbon supplies|
|10453||Additional sputter insert for quick metal change (T E and T ES versions only). NB: This is an entire sputtering assembly; individual targets can also be purchased|
|10360||Variable angle 'Rotacota' rotary planetary specimen stage (rotational speed 8–20 RPM). 50 mm Ø specimen platform with six stub positions for 15 mm, 10 mm, 6.5 mm or 1/8" pin stubs. Stage rotation speed variable between 8–20 RPM|
|10357||Variable tilt angle specimen stage with adjustable tilt up to 90˚. 50 mm Ø specimen platform with six stub positions for 15 mm, 10 mm, 6.5 mm or 1/8" pin stubs. Stage rotation speed variable between 8–20 RPM|
|10458||Flat rotation specimen stage for 4"/100 mm wafers, includes gear box for increased coverage. Stage rotation speed variable between 8-20 RPM|
|10357||90 mm Ø specimen stage for glass microscope slides (up to two x 75 mm x 25 mm slides). Stage rotation speed variable between 8–20 RPM. Includes gear box to allow optional FTM to be used|
|10454||Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and quartz crystals|
|10429||Extended height vacuum chamber (214 mm in height - the standard chamber is 127 mm high). For increased source to specimen distance and for coating large specimens|
|10422||Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the Q150T when bench depth is limited|
Thermal evaporation of carbon to generate thin conductive layers for scanning electron microscopy applications like energy dispersive x-ray spectroscopy (EDS) and wavelength dispersive x-ray spectrometry (WDS).
High-vacuum carbon coaters
High-vacuum carbon coaters have become more widespread over the past few years. Their big advantage is a virtually "clean" vacuum, achieved by a turbomolecular pump, which is particularly important for TEM applications like the production of carbon support films or surface replicas. Producing very thin amorphous carbon layers also requires high-vacuum.